| 摘要 |
An applicator suitable for applying a substance to a substrate, which applicator has a surface having a first wetting angle and a first surface area, which surface has grafted thereto a layer whose surface has a second wetting angle and a second surface area, wherein the second wetting angle is less than the first wetting angle and the second surface area is greater than the first surface area. Such applicators may be made by treatment of their original surface with an ion-producing gas plasma, according to known methods, and show significant improvements in laydown, pickup and application over untreated applicators. |
