发明名称 MEASURING METHOD FOR SURFACE ROUGHNESS ANISOTROPY
摘要 PROBLEM TO BE SOLVED: To measure, evaluate and analyze the surface roughness anisotropy of a member to be measured for a short time, by measuring the surface roughness along the circumference including the center of the measurement area inside. SOLUTION: The surface roughness is measured by a probe 23 along the circumference L, while rotating a rotary table 25 on which a measurement member M such as a silicon wafer, is placed. A radius of a measurement circle is, for example, 20mm, and the speed of rotation of the table 25 is, for example, 0.238rpm. The measured data is memorized in a personal computer in synchronization with the data on the rotation angle from a rotary encoder installed on the table 25. The calculation of the surface roughness, for example, performed by forming the autocorrelation chart on 360 points in total, by the angle of rotation of±2.9 deg., while shifting a phase of the data obtained every 0.02 deg., by 1 deg.. As mentioned in the above, the surface roughness of the measurement face in a whale direction can be measured by one measurement, and the anistropy can be measured for a short time.
申请公布号 JPH09329405(A) 申请公布日期 1997.12.22
申请号 JP19960151386 申请日期 1996.06.12
申请人 NIPPON STEEL CORP;KURODA PRECISION IND LTD 发明人 ABE KOZO;IGUCHI NOBUAKI
分类号 G01B5/28;(IPC1-7):G01B5/28 主分类号 G01B5/28
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