Vacuum coating device for application of substrate thin-film layers

摘要

The vacuum coating device has at least one additional particle beam focusing device coupled to an additional voltage source, e.g. a MF voltage source (45) and provided with at least one grid (40). Pref. the MF voltage provided by the additional voltage source is overlaid with a DC voltage and applied to the grid. The vacuum coating device pref. uses a magnetron sputtering device for vapour deposition of thin-film layers.