| 摘要 |
PROBLEM TO BE SOLVED: To provide a processing device wherein a substrate introduction cycle can be sufficiently shortened in substrate processing. SOLUTION: A plurality of vacuum processing chambers 4 and 8 are, through a gate 22, connected to a vacuum transportation chamber 10. In the vacuum transportation chamber 10, a plurality of load lock chambers are provided radially through the gate 22, they constituting a load lock chamber unit 20. On the outside of the unit 20, a cassette 40 for holding a substrate is provided. In addition in the vacuum transportation chamber 10, a substrate transportation mechanism 60 which transports the substrate between each load lock chamber and each vacuum processing chamber is provided, further, a substrate transportation mechanism 50 which transports the substrate between the cassette 40 and each load lock chamber is provided. A plurality of vacuum processing chambers are provided above a plurality of load lock chambers, and the substrate transportation mechanism 50 sequentially performs carrying in/out of the substrate to each load lock chamber while the load lock unit 20 is rotated. |
