发明名称 |
Positive working photoresist composition |
摘要 |
Provided is a positive working photoresist composition which comprises a 1,2-quinonediazide compound and an alkali-soluble resin obtained by condensing a specified phenol compound, formaldehyde and a specified aromatic aldehyde having at least one alkoxy substituent and at least one hydroxy substituent.
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申请公布号 |
US5709977(A) |
申请公布日期 |
1998.01.20 |
申请号 |
US19960677143 |
申请日期 |
1996.07.09 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
TAN, SHIRO;KAWABE, YASUMASA |
分类号 |
G03F7/023;(IPC1-7):G03F7/023 |
主分类号 |
G03F7/023 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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