Function layer manufacturing method for electronic component or substrate in vacuum plasma

摘要

The manufacturing method involves forming a functional layer of electronic components and/or substrates in the plasma. The components and/or substrate are brought into a chamber. The chamber is then evacuated. Next, a processing gas or gas mixture is provided. The gas or gas mixture is activated by a high frequency alternating voltage via at least one antenna into the chamber. The antennae (16) and the components and/or the substrate (4) are movable relative to each other. Preferably, the pressure, the temperature, the power and the frequency of the voltage can be regulated independently of each other. After plasma treatment, the electronic components and/or substrate may be cooled by gas rinsing.