发明名称 Field effect type semiconductor device and manufacturing method thereof
摘要 It is an abject to stably and surely perform protection operation of devices. Since the gate threshold voltage VGE(th)S in a sense IGBT cell constituting a sensing circuit is set to have a higher value than the gate threshold voltage VGE(th)M in a main IGBT cell constituting a main circuit, a finite time DELTA t is required from when the gate voltage VGE reaches the gate threshold voltage VGE(th)M until when it reaches the gate threshold voltage VGE(th)S in the turn-on period. Accordingly, the rise of the main current Is of the sensing circuit is delayed from the main current Im of the main circuit. As a result, surge current does not appear in the current Is. As the surge current does not appear in the main current of the sensing circuit, a protection circuit of the device operates stably, and breakdown of the device is surely prevented.
申请公布号 US5729032(A) 申请公布日期 1998.03.17
申请号 US19950386059 申请日期 1995.02.07
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 TOMOMATSU, YOSHIFUMI;ISHIMURA, YOUICHI
分类号 H01L27/06;H01L21/336;H01L27/02;H01L27/04;H01L29/10;H01L29/739;H01L29/78;(IPC1-7):H01L29/74 主分类号 H01L27/06
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