发明名称 |
Field effect type semiconductor device and manufacturing method thereof |
摘要 |
It is an abject to stably and surely perform protection operation of devices. Since the gate threshold voltage VGE(th)S in a sense IGBT cell constituting a sensing circuit is set to have a higher value than the gate threshold voltage VGE(th)M in a main IGBT cell constituting a main circuit, a finite time DELTA t is required from when the gate voltage VGE reaches the gate threshold voltage VGE(th)M until when it reaches the gate threshold voltage VGE(th)S in the turn-on period. Accordingly, the rise of the main current Is of the sensing circuit is delayed from the main current Im of the main circuit. As a result, surge current does not appear in the current Is. As the surge current does not appear in the main current of the sensing circuit, a protection circuit of the device operates stably, and breakdown of the device is surely prevented.
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申请公布号 |
US5729032(A) |
申请公布日期 |
1998.03.17 |
申请号 |
US19950386059 |
申请日期 |
1995.02.07 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
TOMOMATSU, YOSHIFUMI;ISHIMURA, YOUICHI |
分类号 |
H01L27/06;H01L21/336;H01L27/02;H01L27/04;H01L29/10;H01L29/739;H01L29/78;(IPC1-7):H01L29/74 |
主分类号 |
H01L27/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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