发明名称 METHOD FOR PRODUCING FRAME-EQUIPPED VAPOR DEPOSITION MASK, STRETCHING APPARATUS, APPARATUS FOR PRODUCING ORGANIC SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR DEVICE
摘要 A method for producing a frame-equipped vapor deposition mask sequentially includes preparing a vapor deposition mask including a metal mask having a slit and a resin mask having an opening corresponding to a pattern to be produced by vapor deposition at a position overlapping the slit, the metal mask and the resin mask being stacked, retaining a part of the vapor deposition mask by a retainer and stretching the vapor deposition mask retained by the retainer outward, and fixing the vapor deposition mask in a state of being stretched to a frame having a through hole. During stretching, any one or both adjustments of a rotating adjustment and a moving adjustment of the vapor deposition mask are performed with respect to the vapor deposition mask in the state of being stretched or with the vapor deposition mask being stretched.
申请公布号 US2016301006(A1) 申请公布日期 2016.10.13
申请号 US201615188111 申请日期 2016.06.21
申请人 Dai Nippon Printing Co., Ltd. 发明人 OBATA Katsunari;TAKEDA Toshihiko;HONMA Yoshiyuki;OKAMOTO Hideyuki
分类号 H01L51/00;C23C14/04 主分类号 H01L51/00
代理机构 代理人
主权项 1. A method for producing a frame-equipped vapor deposition mask, comprising the steps of: preparing a vapor deposition mask including a metal mask having a slit and a resin mask having an opening corresponding to a pattern to be produced by vapor deposition at a position overlapping with the slit, the metal mask and the resin mask being stacked; retaining a part of the vapor deposition mask by a retainer; stretching the vapor deposition mask outwardly by the retainer; and fixing, after the stretching step, the vapor deposition mask to a frame having a through-hole with the vapor deposition mask stretched, and wherein in the stretching step, the vapor deposition mask is adjusted by rotating or linearly moving with the vapor deposition mask stretched.
地址 Tokyo JP