SUBSTRATE OF PHOTOELECTRIC CONVERSION DEVICE AND METHOD OF MANUFACTURING THE SAME

摘要

A manufacturing method of a substrate of a photoelectric conversion device includes the following steps. A single crystal silicon wafer is set into a chamber of a machine, wherein a germanium target or a silicon germanium target is disposed in the chamber. Thereafter, a physical vapor deposition process is performed to form a single crystal germanium thin film or a single crystal silicon germanium thin film on the single crystal silicon wafer. The manufacturing method reduces the production cost of substrates of photoelectric conversion devices. Furthermore, another substrate of a photoelectric conversion device is also provided.

主权项

1. A method of manufacturing a substrate of a photoelectric conversion device, comprising the steps of:
disposing a single crystal silicon wafer into a chamber of a machine, wherein the chamber has a germanium target or a silicon germanium target therein; and performing a physical vapor deposition, for forming a single crystal germanium thin film or a single crystal silicon germanium thin film on the single crystal silicon wafer.