| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning device or the like which can shorten the cleaning time of a substrate and obtain uniform cleaning results in a plane.SOLUTION: In a substrate cleaning device 1, a substrate holding part 22 horizontally holds a substrate W, a rotation mechanism 24 rotates the substrate holding part 22 around a vertical axis, a first cleaning member 41 and a second cleaning member 42 are arranged apart from each other in the horizontal direction, and the surface of the substrate is cleaned when the substrate is rotated. The first cleaning member 41 and the second cleaning member 42 are freely movable in the horizontal direction, and freely movable independently in the vertical direction. A control unit 6 moves the first cleaning member 41 and the second cleaning member 42 on the substrate W to clean the substrate, and adjusts the height position of each of the cleaning members 41 and 42 on the basis of information acquired in advance about the height position of the upper surface of the substrate W at the positions of the first cleaning member 41 and the second cleaning member 42. |
