Positive type radiation-sensitive resist composition

摘要

A positive type radiation-sensitive resist composition comprising an alkali-soluble resin, a radiation-sensitive ingredient and a phenol compound represented by general formula (I): wherein R<5>, R<6> and R<7> independently of one another each represent a hydrogen atom, an alkyl group or an alkoxy group and n represents 1, 2 or 3. This composition is a positive type radiation-sensitive resist composition excellent in the balance between performances including resolution, sensitivity and heat resistance.