FORMATION METHOD FOR CONTACT IN SEMICONDUCTOR DEVICE,申请号KR19940027132-传众专利搜索

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发明名称	FORMATION METHOD FOR CONTACT IN SEMICONDUCTOR DEVICE
摘要
申请公布号	KR0147870(B1)	申请公布日期	1998.11.02
申请号	KR19940027132	申请日期	1994.10.24
申请人	LG SEMICONDUCTOR CO.,LTD	发明人	LEE, CHANG-JAE
分类号	H01L21/28;H01L21/285;H01L21/44;H01L21/60;H01L21/768;H01L23/522;(IPC1-7):H01L21/28	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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