| 摘要 |
A projection exposure apparatus includes a projection optical system for projecting a pattern of a first object onto a second object; an illuminator for illuminating the pattern of the first object, a wavelength changing device for changing a wavelength of the light from the illuminator; a spherical aberration selector for selecting a spherical aberration of the projection optical system; and a wavelength controller for controlling the wavelength by the wavelength changing device in accordance with the spherical aberration set by the selector.
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