发明名称 |
DEVICE FOR ADJUSTING OPTICAL AXIS OF X RAYS |
摘要 |
PROBLEM TO BE SOLVED: To make it possible to identify detailed intensity profiles of X-ray beams and positions of beam paths with a precision of 1 mm or less. SOLUTION: By varying the intensity of an X-ray beam 1 of an X-ray domain while shielding it little by little against soft X rays with board 2 with a sharp knife edge and a wire, the distribution of beam intensity is measured, the central position of the beam is accurately measured and the position of the X-ray beam 1 is marked with the same accuracy in a space with the position of the edge. This makes it possible to measure an actual path of an X-ray beam accurately and easily and adjust each optical component of a beam line device quickly and accurately. |
申请公布号 |
JPH10319196(A) |
申请公布日期 |
1998.12.04 |
申请号 |
JP19970125248 |
申请日期 |
1997.05.15 |
申请人 |
HITACHI LTD |
发明人 |
HASEGAWA MASAKI;HIRAI YASUHARU |
分类号 |
G21K1/04;G01T1/29;G21K5/04;H05G2/00;(IPC1-7):G21K5/04 |
主分类号 |
G21K1/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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