发明名称 DEVICE FOR ADJUSTING OPTICAL AXIS OF X RAYS
摘要 PROBLEM TO BE SOLVED: To make it possible to identify detailed intensity profiles of X-ray beams and positions of beam paths with a precision of 1 mm or less. SOLUTION: By varying the intensity of an X-ray beam 1 of an X-ray domain while shielding it little by little against soft X rays with board 2 with a sharp knife edge and a wire, the distribution of beam intensity is measured, the central position of the beam is accurately measured and the position of the X-ray beam 1 is marked with the same accuracy in a space with the position of the edge. This makes it possible to measure an actual path of an X-ray beam accurately and easily and adjust each optical component of a beam line device quickly and accurately.
申请公布号 JPH10319196(A) 申请公布日期 1998.12.04
申请号 JP19970125248 申请日期 1997.05.15
申请人 HITACHI LTD 发明人 HASEGAWA MASAKI;HIRAI YASUHARU
分类号 G21K1/04;G01T1/29;G21K5/04;H05G2/00;(IPC1-7):G21K5/04 主分类号 G21K1/04
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