发明名称 SYSTEM AND METHOD FOR EXPOSURE
摘要 PROBLEM TO BE SOLVED: To restrain an exposure system where a laser light source is used from deteriorating in function and accuracy, by a method wherein operations such as gas exchange and gas filling as to the laser light source are made to cooperate with the processing operation of an exposure system main body. SOLUTION: Four interface signals are provided between a main control device 40 on a stepper side and a control system 12 on a laser light source side, so as to carry out cooperation control. Signals PGR and REQ out of the four interface signals are signals transmitted from a laser light source to an aligner main body to inform the exposure system main body that partial gas exchange or halogen gas filling is urgent. Signals STEP and ST serve as level signals which are transmitted from the light aligner main body to the laser source to instruct its operation mode. Signals SHUT and ST serve as level signals which are transmitted from the laser light source to the aligner to indicate the position of a shutter inside the laser light source. Signals EXT and TRG serve as trigger signals transmitted from the aligner main body to the laser light source to enable the laser light source to emit laser rays.
申请公布号 JPH10335246(A) 申请公布日期 1998.12.18
申请号 JP19980163105 申请日期 1998.06.11
申请人 NIKON CORP 发明人 UEMURA TSUNESABURO
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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