| 摘要 |
PROBLEM TO BE SOLVED: To provide a mark for detecting mis-alignment of a mark which is capable of measuring the positional of a mask using proper combination of a first and a second mark at all times. SOLUTION: Mask mis-alignment detecting marks 1, 2, and 3 are composed of first marks 1a, 2a, and 3a which are each corresponding to masks and second marks 1b, 2b, and 3b each arranged in the first marks 1a, 2a, and 3a for detecting the mis-alignment of masks used in a photolithographic process, wherein the first marks 1a, 2a, and 3a are each varied in outer shape corresponding to masks. In these mask mis-alignment detecting marks, the first marks 1a, 2a, and 3a can be distinguished from each other by the difference in the outer shapes. |
