发明名称 Micro-electromechanical apparatus having signal attenuation-proof function, and manufacturing method and signal attenuation-proof method thereof
摘要 A micro-electromechanical apparatus having a signal attenuation-proof function, and a manufacturing method and a signal attenuation-proof method thereof are disclosed. The micro-electromechanical apparatus includes a substrate, an insulation layer, and a sensing unit. The substrate has a doped region in which a majority of conductive carriers have the same polarity as an electronic signal. The insulation layer is located on the substrate, and the sensing unit is located above the insulation layer and forms the electronic signal when sensing a force.
申请公布号 US9506777(B2) 申请公布日期 2016.11.29
申请号 US201514885656 申请日期 2015.10.16
申请人 SAGATEK CO., LTD. 发明人 Lai Kelvin Yi-Tse;Chen Jung-Hsiang;Chen Cheng-Szu;Weng Shu-Yi
分类号 G01D5/24;B81B7/00;B81C1/00 主分类号 G01D5/24
代理机构 Muncy, Geissler, Olds & Lowe, P.C. 代理人 Muncy, Geissler, Olds & Lowe, P.C.
主权项 1. A micro-electromechanical apparatus having a signal attenuation-proof function and comprising: a substrate having a doped region into which an impurity is doped; an insulation layer located on the substrate; and a sensing unit located above the insulation layer, separated from the substrate and comprising a mass bulk, movable electrodes, fixed electrodes, and elastic components, the movable electrodes spaced from and facing the fixed electrodes respectively, the elastic components suspending the mass bulk, the mass bulk coupled with the movable electrodes, and the mass bulk and the movable electrodes configured to vibrate in response to a force, wherein the doped region is located directly below the sensing unit.
地址 Taipei TW