发明名称 Polycrystal silicon rod having an improved morphyology
摘要 A cylindrical polycrystal silicon rod formed of a high-purity polycrystal silicon, characterized in that a crystal having a grain diameter smaller than that of a crystal at a location where the distance from the center of deposition is 50% of the length from the center of deposition is existent in an area where the distance from the center of deposition toward the periphery is more than 50% of the length in the same lengthwise direction.
申请公布号 US5904981(A) 申请公布日期 1999.05.18
申请号 US19980084421 申请日期 1998.05.27
申请人 TOKUYAMA CORPORATION 发明人 ODA, HIROYUKI
分类号 C30B25/00;(IPC1-7):D02G3/00;C01B33/02 主分类号 C30B25/00
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