| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligning method, which corrects a measuring error in a sensor for measuring the light amount and measures with high precision radiated amount and an accumulated aligning amount, even when the radiated amount is changed over a wide range without providing special cooling mechanisms. SOLUTION: When an illuminous light IL is radiated and a pattern of a reticle R is aligned to a wafer W, a thermal drift which is overlapped on an output signal (irradiated energy) Ek measured by a luminous intensity variations sensor 49, which receives the illuminuous light IL and photoelectrically converts is acquired, based on the measured output signal Ek from equation yk+1 =exp(-Δt/T)yk +Czi (1-exp(-Δt/T))Ek (whereΔt is a sampling period, yk is thermal drift, T is a time constant, Ek is radiated energy and Czi is a constant). A true radiated energy Ekz is acquired, based on the output signal Ek and the thermal drift yk+1 .
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