发明名称 CHARGED PARTICLE BEAM APPARATUS
摘要 PROBLEM TO BE SOLVED: To make a charged particle beam apparatus compact and to solve unstableness of setting a specimen by installing a radiation axis of a charged particle beam radiation system slantingly to the vertical direction in a specimen chamber. SOLUTION: A specimen 1 such as a wafer with a large diameter is put on a specimen stage 2 which can sharply be inclined from 0 to 60 degrees and the upper face of the specimen stage is controlled to be horizontal in the vicinity of the inclination angle of the specimen stage 2 at the middle angleθm=(θ1+θ2)/2=(0+60)/2=30. The bearing to the specimen supporting face of the specimen stage 2 is improved against the gravity applied to the wafer specimen even of the specimen is sharply inclined and the force applied to the inclination apparatus to return the inclination of the apparatus by the large inclination of the specimen can be lowered. Installation of a downward projecting object, for example an objective lens exchanging mechanism, in the surrounding of a radiation system 3 is facilitated by utilizing the opposite space formed by inclining the radiation system.
申请公布号 JPH11162386(A) 申请公布日期 1999.06.18
申请号 JP19970327367 申请日期 1997.11.28
申请人 JEOL LTD 发明人 WATANABE IWAO
分类号 H01L21/66;H01J37/16;H01J37/20;(IPC1-7):H01J37/16 主分类号 H01L21/66
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