| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint mold and imprint method for producing a pattern formation body free from defect by making a transfer material, dispensed on an imprint mold of good detachability, stay at a desired position.SOLUTION: An imprint mold for transferring an uneven pattern to a transfer material includes a substrate, a main pattern including a first fine uneven structure formed on the principal surface of the substrate, and an auxiliary pattern including a second fine uneven structure formed at least partially in a region where the main pattern is not formed, out of the surface of the substrate where the main pattern is formed. The surface of the substrate where at least the main pattern and auxiliary pattern are formed is formed so that the detachability from the hardened transfer material becomes high.SELECTED DRAWING: Figure 5 |
