New 2-carboxy-5-hydroxy-6-norbornyl (meth)acrylate, ester and copolymers useful in photoresist, e.g. for structurizing silicon wafer

摘要

New photoresist monomers comprise 2-carboxy-5-hydroxy-6-norbornyl (meth)acrylate and the tert.-butyl, tetrahydropyranyl, tetrahydrofuranyl and 1-ethoxyethyl esters. New photoresist monomers comprise 2-carboxy-5-hydroxy-6-norbornyl (meth)acrylate and the tert.-butyl, tetrahydropyranyl, tetrahydrofuranyl and 1-ethoxyethyl esters of formula (I): R = 2-tert.-butoxycarbonyl, 2-carboxyl, 2-tetrahydropyranyloxycarbonyl, 2-tetrahydrofuranyloxycarbonyl or 1-ethoxyethyloxycarbonyl; R1 = H or CH3 Independent claims are included for: (a) preparation of (I); (b) photoresist copolymers of (I); (c) preparation of the copolymers; (d) photoresist compositions containing the copolymers; (e) preparation of the photoresist compositions; (f) production of photoresist patterns; and (g) semiconductor elements produced using the photoresist compositions.