发明名称 PHOTOLITHOGRAPHICAL PROCESS APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a photolithographical process apparatus which can produce works with a high yield, without causing remarkable increase in its cost and footprint as well as reduction of the throughput of the entire apparatus. SOLUTION: A loader 1, a cleaning part 2, a resist coating part 3, a peripheral resist removing part 4, an light exposure part 5, an developing part 6, and an unloader 7 are connected inline. When cassette containing works is fed into the loader 1, a robot 8a extracts works from the cassette one-by-one and carries them onto a transportation robot. Thereafter each work is fed sequentially to the respective processing parts by the transportation robot. A buffer part accepts the works from the transportation robot by means of a robot 8b, and a foreign matter inspection part 10 counts the number of foreign matters attached to the work. As a result of counting the number of foreign matters attached to the work, if the number is larger than the inspection result carried out just previously, it can be judged that dust was generated in the just-previous processing part.
申请公布号 JPH11214284(A) 申请公布日期 1999.08.06
申请号 JP19980010077 申请日期 1998.01.22
申请人 SHARP CORP 发明人 MIYAKE TOSHIYUKI
分类号 G03F7/20;H01L21/02;H01L21/027;H01L21/66;H01L21/677;(IPC1-7):H01L21/027;H01L21/68 主分类号 G03F7/20
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