| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photoresist compsn. having high sensitivity, excellent in the rate of a residual film and free from the occurrence of foreign matter by blending an alkali-soluble resin with a specified quinonediazidosulfonate as a photosensitive component. SOLUTION: An alkali-soluble resin is blended with a quinonediazidosulfonate of the formula as a photosensitive component. In the formula, R1 -R5 are each H, halogen, hydroxyl, 1-5C alkyl, 2-3C alkenyl or 1-3C hydroxyalkyl, R1 -R5 may be identical or different, R6 is H, 1-3C alkyl, 2-3C alkenyl or aryl and the number of hydroxyl groups is 3-4. The pref. esterification ratio of a quinonediazido compd. to a phenolic compd. is 50-100 mol.%, particularly 65-95 mol.%, further particularly 70-90%. |
