发明名称 Method of planarizing a curved substrate and resulting structure
摘要 According to the present invention a technique for providing a planarized substrate with dendritic connections of solder balls, especially a multi-layer ceramic substrate is provided. In the case where the substrate has a raised central portion on the top surface on which are disposed top surface metallurgy pads, a layer of conformable photoimagable material is placed over the top surface. The photoimagable material is exposed and developed in a pattern corresponding to the pattern of the top surface metallurgy pads to form vias in the photoimagable material. Copper is plated in the vias in contact with the top surface metallurgy pads. The exposed surface of the photoimagable surface is then planarized, preferably by mechanical polishing to form a flat planar surface, with the ends of the vias exposed. Dendritic connector pads are then grown on the exposed ends of the vias to which solder ball connections of an I/C chip are releasably connected.
申请公布号 US5940729(A) 申请公布日期 1999.08.17
申请号 US19960633984 申请日期 1996.04.17
申请人 INTERNATIONAL BUSINESS MACHINES CORP. 发明人 DOWNES, JR., FRANCIS JOSEPH;FUERNISS, STEPHEN JOSEPH;HILL, GARY RAY;INGRAHAM, ANTHONY PAUL;MARKOVICH, VOYA RISTA;MOLLA, JAYNAL ABEDIN
分类号 H01L21/60;H01L23/13;H01L23/498;H05K1/03;H05K1/11;H05K3/00;H05K3/34;H05K3/46;(IPC1-7):H01L21/44 主分类号 H01L21/60
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