| 摘要 |
PROBLEM TO BE SOLVED: To allow easy correction for suppressing transfer misalignment of a transfer pattern. SOLUTION: A substrate mount stage 11 where, moving in a specified direction, a substrate 12 which is to be exposed is mounted, a mask mount stage where, moving in the direction reverse to scan-move direction of the substrate mount stage 11, a mask 14 wherein a pattern 15 to be transferred to the substrate 12 is formed is mounted, a light source 16 with which the substrate 12 is exposed through the mask 14 mounted on the mask mount stage 13, optical systems 17 and 18 for introducing light from the light source 16 to the substrate 12, and a slit 19 which limits projection range of the light introduced to the substrate 12 through the optical system, are provided in a step and scan type aligner. Here, a mechanism 20 to change width of slit is provided. |
