METHOD OF HOLE FORMATION MASK PRODUCTION USING TRANSPARENT CINNABARITE BALL

摘要

PURPOSE: A method of a hole formation mask produce using a transparent cinnabarite ball is provided to realize the high integration of the devices by forming the contact hole of a semiconductor to be under the submicron size in its diameter. CONSTITUTION: A method of a hole formation mask produce comprises the steps of: forming a hole mask by fixing a transparent cinnabarite ball(23) on the upper part of a quartz substrate(21) using a metal(25); forming etched layer(13) onto the substrate and then forming positive photosensitive film(15); and exposing the photosensitive film by an exposing process using the hole mask.