| 摘要 |
PROBLEM TO BE SOLVED: To allow gas to operate on a work in a treatment chamber nearly uniformly by controlling the flow of the gas in a direction from the opposite side of the work at a central part in the radial direction of a diffusion plate where an introduction hole is formed toward a diffusion plate and unloading the gas that is introduced to the treatment chamber through the introduction hole from the treatment chamber. SOLUTION: Gas flows into an upper space part 8a of a supply chamber 8 of an activated chamber 1. The gas flowing into the upper space part 8a flows nearly horizontally in the radial direction of the space part 8a and flows from a through hole 23 that passes the inside from the upper-end opening of a cylindrical body 24 that is allowed to project in a partition board 21 to a lower space part 8b. The gas flowing into the lower space part 8b flows from a central part in the radial direction of the upper surface of a diffusion plate 7 toward the peripheral part and at the same time passes through its introduction hole 7a and flows into a treatment chamber 9. Then, gas flowing into the treatment chamber 9 flows from a central part on the upper surface of the work 3 toward the peripheral part, passes through a dispersion hole 25a of a dispersion plate 25, and in unloaded from an unloading hole 11.
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