| 摘要 |
<p>An apparatus for simultaneously transporting and processing substrates is described. The apparatus includes a load lock (18) that stores at least one substrate prior to processing and that stores at least one substrate after processing. A first transport mechanism (40) transports at least one substrate into and out of the load lock. A multi-stage elevator (24) is adapted to receive the first transport mechanism. A first process chamber (26) is vertically disposed from the multi-stage elevator. The multi-stage elevator vertically transports at least one substrate into and out of the first process chamber. A second process chamber (42) may be coupled to the multi-stage elevator. A second transport mechanism (44) transports at least one substrate between the multi-stage elevator and the second process chamber.</p> |
