发明名称 Procedure for formation of relief formations on the surface on a substrate for use in production of flat screen displays that use micropoint electron sources
摘要 Procedure involves formation of a masking layer (108) on a substrate (100). Typically the masking layer is a material such as porous aluminum, the transverse holes (110) of which are used in the formation of relief formations (112) on the substrate surface. An Independent claim is made for a device using the an etching mask produced according to the main claim in which a micropoint source of electrons is created from a cathode substrate in which the micropoints are formed in openings created by use of the relief mask.
申请公布号 FR2786026(A1) 申请公布日期 2000.05.19
申请号 FR19980014403 申请日期 1998.11.17
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 PERRIN AIME
分类号 G09G3/20;H01J19/24;H01L21/20;(IPC1-7):H01L21/20 主分类号 G09G3/20
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