发明名称 |
Procedure for formation of relief formations on the surface on a substrate for use in production of flat screen displays that use micropoint electron sources |
摘要 |
Procedure involves formation of a masking layer (108) on a substrate (100). Typically the masking layer is a material such as porous aluminum, the transverse holes (110) of which are used in the formation of relief formations (112) on the substrate surface. An Independent claim is made for a device using the an etching mask produced according to the main claim in which a micropoint source of electrons is created from a cathode substrate in which the micropoints are formed in openings created by use of the relief mask.
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申请公布号 |
FR2786026(A1) |
申请公布日期 |
2000.05.19 |
申请号 |
FR19980014403 |
申请日期 |
1998.11.17 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
PERRIN AIME |
分类号 |
G09G3/20;H01J19/24;H01L21/20;(IPC1-7):H01L21/20 |
主分类号 |
G09G3/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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