发明名称 LASER ANNEALING FURNACE AND LASER ANNEALING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a laser annealing which is designed to improve the quality of laser annealing and to reduce the manufacturing cost and a laser annealing method. SOLUTION: In the annealing chamber 37 of a laser annealing furnace, a stage 37b on which a substrate 1 is placed and an atmosphere separating cover 39 which encircles the laser-irradiated area of the substrate 1 are provided. An oxygen concentration sensor 41 is provided in the cover 39 and a gas supply section 40 controls the oxygen concentration in the atmosphere on the substrate 1 near the laser-irradiated area to a prescribed value by supplying a gas into the cover 39 based on the data obtained by means of the sensor 41 through measurement. Under such a condition, the laser-irradiated area of the substrate 1 is irradiated with the laser beam emitted from a laser oscillator through the inside of the cover 39.
申请公布号 JP2000150410(A) 申请公布日期 2000.05.30
申请号 JP19990338511 申请日期 1999.11.29
申请人 TOSHIBA CORP 发明人 SUZUKI NAOKI;HIRATA NORIYUKI;SHIMIZU MASATOSHI;HIGASHIJIMA TAKUO;TAKAHASHI HIROAKI;KOMATSUBARA YOSHIAKI
分类号 H01L21/268;H01L21/20;H01L21/304;H01L21/336;H01L29/786;(IPC1-7):H01L21/268 主分类号 H01L21/268
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