发明名称 |
LASER ANNEALING FURNACE AND LASER ANNEALING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a laser annealing which is designed to improve the quality of laser annealing and to reduce the manufacturing cost and a laser annealing method. SOLUTION: In the annealing chamber 37 of a laser annealing furnace, a stage 37b on which a substrate 1 is placed and an atmosphere separating cover 39 which encircles the laser-irradiated area of the substrate 1 are provided. An oxygen concentration sensor 41 is provided in the cover 39 and a gas supply section 40 controls the oxygen concentration in the atmosphere on the substrate 1 near the laser-irradiated area to a prescribed value by supplying a gas into the cover 39 based on the data obtained by means of the sensor 41 through measurement. Under such a condition, the laser-irradiated area of the substrate 1 is irradiated with the laser beam emitted from a laser oscillator through the inside of the cover 39. |
申请公布号 |
JP2000150410(A) |
申请公布日期 |
2000.05.30 |
申请号 |
JP19990338511 |
申请日期 |
1999.11.29 |
申请人 |
TOSHIBA CORP |
发明人 |
SUZUKI NAOKI;HIRATA NORIYUKI;SHIMIZU MASATOSHI;HIGASHIJIMA TAKUO;TAKAHASHI HIROAKI;KOMATSUBARA YOSHIAKI |
分类号 |
H01L21/268;H01L21/20;H01L21/304;H01L21/336;H01L29/786;(IPC1-7):H01L21/268 |
主分类号 |
H01L21/268 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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