| 摘要 |
PROBLEM TO BE SOLVED: To realize an etching method effective for fine machining of a BST (BaxSr1-xTiO3) film. SOLUTION: Only Ti element in a BST film 9 to be a part of contact holes 14 is selectively removed by the reactive ion etching using Cl2 gas, then, as the result, the BST film 9 to be a part of the contact holes changes to a Ba- Sr-Cl-O film 13, and this film 13 is removed by the wet etching using dil. hydrochloric acid soln.
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