发明名称 PLATING DEVICE AND PLATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a plating device by which a high-precision plating is obtained at a high speed. SOLUTION: This device in which a material 8 to be treated is held vertically and conveyed in the tank has a conveyor hanger 3 for holding the material and applying a plating current, a plating tank conveying means 13 for suspending the hanger and applying a plating current, a pretreating conveyor 11 for transferring the hanger and a positioning and conveying means 12 for detaching the conveyor hanger from conveyor, transferring the hanger at a higher speed than the plating tank conveying means and mounting the materials on the plating tank conveying means at regular intervals. The tank is conveyed at a definite speed, the interval between the tank and the material previously attached to the plating tank conveying means is kept at such a distance that the plating thickness is kept uniform, the hanger holding the following material is attached to the plating tank conveying means and conveyed, and plating is performed.
申请公布号 JP2000226697(A) 申请公布日期 2000.08.15
申请号 JP19990029078 申请日期 1999.02.05
申请人 FUJIMOTO DENKI SHOJI KK;FUJIWARA SHIGERU;CLOTH:KK 发明人 ISHIHAMA SADAO;FUJIMOTO MASAHIRO;FUJIWARA SHIGERU
分类号 H05K3/18;C25D17/06;C25D17/08;(IPC1-7):C25D17/06 主分类号 H05K3/18
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