| 摘要 |
PROBLEM TO BE SOLVED: To prevent re-incidence of scattering electrons from a stage or a sample holding member by providing a means that absorbs electron beam transmitted through a lithography sample onto the stage or the sample holding member, and placing the means that absorbs electron beam on an incident line of incident electron beam. SOLUTION: In an area over a deflection range of electron beam 6, drawing is performed by horizontally moving a sample holding member 5 with a movable stage 8 on a stage 9, and openings 26 and 27 are provided to the parts right under a drawing area of the sample holding member 5 and the movable stage 8, respectively. During drawing, the electron beam 6 transmitted through a lithography sample 19 is made incident through the openings 26 and 27 of the sample holding member 5 and the movable stage 8 into a deep hole 20. The electron beam 6 that is made incident into the deep hole 20 is scattered several times at a wall of the deep hole 20 to absorb almost the entire beam in the deep hole 20.
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