| 摘要 |
PURPOSE: A heating system in an apparatus for manufacturing a semiconductor is provided to heat a solution to a desired temperature and to maintain the temperature of the solution constant by having a simplified structure and maintaining a purity of the solution. CONSTITUTION: A heating system for heating a solution composed of a predetermined chemical material for processing a wafer, comprises a bath(100) for the solution, and a heater for heating the solution by generating a microwave of a predetermined frequency. The heater further comprises a microwave generator(230), a sensor(210) for sensing a temperature of the solution, and a temperature controller(220). The microwave generator generates the microwave of which a frequency is controlled by a temperature control signal. The temperature controller generates the temperature control signal for maintaining a predetermined temperature according to a sensing result of the sensing element.
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