| 摘要 |
PROBLEM TO BE SOLVED: To provide a film forming device equipped with a heating means which is capable of stabilizing the surface temperature of a substrate in a shorter time and less dependent on the structure of the substrate. SOLUTION: This sheet-type vacuum CVD device 1A is composed of a reaction chamber 21A, a transfer opening 9 which is provided on the wall 3A of the reaction chamber 21A and through which the substrates W are loaded into or unloaded from the reaction chamber 21A sheet by sheet, a susceptor 4 where the substrate W loaded into the chamber 21A through the opening 9 is mounted and directly heated from below its rear surface, a direct heating device 5 which heats the susceptor 4 direct, an indirectly heating device 210 which is provided outside the reaction chamber 21A to indirectly heat the substrate W placed on the susceptor 4 with radiation heat, and a reaction gas feed pipe 6 provided above the susceptor 4.
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