发明名称 |
METHOD AND DEVICE FOR CONTINUOUSLY FEEDING ALKALI IN CHEMICAL TREATMENT PLANT |
摘要 |
PROBLEM TO BE SOLVED: To provide the method and device capable of continuously feeding deliquescent alkali without causing any caking with moisture into a chemical treatment plant by preventing the alkali from being made in contact with steam at high temperature. SOLUTION: In a chemical treatment plant in which alkali is continuously fed into a reaction tank having the possibility of generating steam at high temperature, slurry consisting of a mixture of pulverized alkali and the oil into in viscosity obtained by pulverizing the alkali together with oil the size of <100μm in a ball mill 3 is fed to the reaction tank 9, thereby stably and continuously feeding the deliquescent alkali without being caked with moisture.
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申请公布号 |
JP2001000853(A) |
申请公布日期 |
2001.01.09 |
申请号 |
JP19990175614 |
申请日期 |
1999.06.22 |
申请人 |
EBARA CORP |
发明人 |
NAKAMURA KAZUO;KARAKI RYOTARO |
分类号 |
A62D3/30;A62D3/36;A62D101/22;B01J4/00;B01J19/00;(IPC1-7):B01J4/00;A62D3/00 |
主分类号 |
A62D3/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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