发明名称 |
STEPPER ALIGNMENT MARK FORMATION WITH DUAL FIELD OXIDE PROCESS |
摘要 |
<p>A semiconductor photomask set for producing wafer alignment accuracy in a semiconductor fabrication process. The photomask set produces an alignment mark that is accurate for subsequent fabrication after undergoing a dual field oxide (FOX) fabrication process. Prior arts methods have traditionally covered the alignment marks with layers of oxide material. The method includes the steps of: (a) providing a first photomask member having mask portions for forming a plurality of first field oxide regions on a first region of a semiconductor substrate and also having a mask portion for forming an alignment marker; (b) providing a second photomask member having mask portions for forming a plurality of second field oxide regions on a second region of the semiconductor substrate and also having mask portions delineated for covering any first field oxide regions and alignment marker formed by using the first photomask member; (c) forming the first field oxide regions and the alignment marker utilizing the first photomask member; (d) covering the formed first field oxide regions and the alignment marker with a photoresist material by utilizing the second photomask member; (e) forming the second field oxide regions after utilizing the second photomask member; (f) facilitating wafer alignment accuracy by removing the photoresist material and exposing the alignment marker; and (g) aligning a semiconductor wafer by utilizing the exposed alignment marker. The mask set can be used in conjunction with stepper wafer alignment tools and is especially useful in forming a memory semiconductor product capable of performing block data erasure operations. The exposed alignment marker facilitates checking and testing mask misalignment during the fabrication process.</p> |
申请公布号 |
EP1068641(A1) |
申请公布日期 |
2001.01.17 |
申请号 |
EP19990909764 |
申请日期 |
1999.03.02 |
申请人 |
ADVANCED MICRO DEVICES INC.;FUJITSU LIMITED |
发明人 |
KAJITA, TATSUYA;CHANG, MARK, S. |
分类号 |
G03F1/08;G03F7/00;G03F7/20;H01L21/02;H01L21/027;H01L21/8239;H01L23/544;(IPC1-7):H01L23/544;H01L21/32 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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