LAMINATED FILM AND VAPOR DEPOSITION FILM USING THE SAME

摘要

A laminated film (1) which comprises a substrate layer (A layer) selected from a polyester film and an aliphatic polyamide film and, laminated on at least one surface thereof, a polyamide layer (C layer), as a layer on which vapor deposition is performed, containing an aromatic polyamide having a glass transition temperature of 60 DEG C or higher as a main component, wherein an average roughness (Ra) on the central line of the polyamide layer is in a range of 0.005 to 0.03 mu m; and a laminated film (2) which comprises a substrate layer (A layer) selected from a polyester film and an aliphatic polyamide film and, laminated on at least one surface thereof, a polyamide layer (C layer), as a layer on which vapor deposition is performed, containing an aromatic polyamide having a glass transition temperature of 60 DEG C or higher as a main component, and further, formed between the substrate A layer and the polyamide C layer, a layer (B layer) comprising one or a plurality of polymers having an SP value of 10 to 15. These laminated layers are significantly improved in vapor deposition processability and gas-barrier properties as compared to conventional gas-barrier films.