| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam exposure system having a sealing structure capable of rotating a stage at high speeds. SOLUTION: An electron beam exposure system 1 includes a motor 21 and a moving mechanism 23 for straightly moving the motor 21 in the horizontal direction. A stage 17 on which a work 16 is placed is fixed to a motor rotary shaft 22. Also, an electron beam column 9 is disposed above the stage 17. An exposure space 4 is formed in a box 5. The box 5 has an elongated hole 18 surrounding the moving region of the rotary shaft 22, a bottom wall 6 opposed to the bottom surface of the stage 17 via a small gap therebetween, a ceiling wall 7 and a peripheral wall 8 which form the exposure space 4 in cooperation with the bottom wall 6. The exposure space 4 is connected to a vacuum pump 27 and is evacuated to a vacuum.
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