发明名称 |
LIQUID SUPPLY SYSTEM AND SYSTEM FOR PROCESSING SUBSTRATE USING IT |
摘要 |
PROBLEM TO BE SOLVED: To provide a system for detecting the supply pressure of processing liquid being supplied by a pressurizing system and delivering clean processing liquid from an delivery opening onto the surface of a substrate. SOLUTION: Nitrogen gas is supplied from a pressure source 33 to a processing liquid storage tank 31 and processing liquid is delivered from a nozzle 23 through delivery piping 36. The processing liquid storage tank 31 is coupled with one end of a measuring tube 41 having the other end provided with a pressure sensor 42. The pressure sensor 42 delivers a detection signal to a control means 5 which monitors the detection signal. The control means 5 has a control section 5 for comparing a measured pressure level with a set pressure prestored in a storage section 53 and outputting an abnormal signal if they do not match each other. The abnormal signal presents an abnormal state at a display section. |
申请公布号 |
JP2001155990(A) |
申请公布日期 |
2001.06.08 |
申请号 |
JP19990340049 |
申请日期 |
1999.11.30 |
申请人 |
DAINIPPON SCREEN MFG CO LTD |
发明人 |
YAMASHITA TETSURO |
分类号 |
H01L21/027;G03F7/30;H01L21/304;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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