发明名称 LIQUID SUPPLY SYSTEM AND SYSTEM FOR PROCESSING SUBSTRATE USING IT
摘要 PROBLEM TO BE SOLVED: To provide a system for detecting the supply pressure of processing liquid being supplied by a pressurizing system and delivering clean processing liquid from an delivery opening onto the surface of a substrate. SOLUTION: Nitrogen gas is supplied from a pressure source 33 to a processing liquid storage tank 31 and processing liquid is delivered from a nozzle 23 through delivery piping 36. The processing liquid storage tank 31 is coupled with one end of a measuring tube 41 having the other end provided with a pressure sensor 42. The pressure sensor 42 delivers a detection signal to a control means 5 which monitors the detection signal. The control means 5 has a control section 5 for comparing a measured pressure level with a set pressure prestored in a storage section 53 and outputting an abnormal signal if they do not match each other. The abnormal signal presents an abnormal state at a display section.
申请公布号 JP2001155990(A) 申请公布日期 2001.06.08
申请号 JP19990340049 申请日期 1999.11.30
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 YAMASHITA TETSURO
分类号 H01L21/027;G03F7/30;H01L21/304;(IPC1-7):H01L21/027 主分类号 H01L21/027
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