发明名称 ATMOSPHERIC PRESSURE CVD SYSTEM AND FILM DEPOSITION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method for improving the problem that, in the conventional orifice for controlling exhaust having self-cleaning function, every time a spring rotates so as to follow, stress in the twist direction has periodically been applied, so that the spring has been easy to be cut, and the working ratio of the atmospheric pressure CVD system has been inferior. SOLUTION: This system is provided with a rotatable orifice for controlling exhaust having an orifice hole 1 in the central part and also composed of orifice forming bodies 2 in which the vertex angles 8 are confronted with the central axis 5 of the orifice hole 1 as a symmetry axis, and the cross-sectional shapes are formed of isosceles triangles and a stick 3 for cleaning provided adhesively to the surface and back faces of the orifice forming bodies 2 through the orifice hole 1. The outer circumferential part of the orifice forming bodies 2 is provided with a gear 6, and the orifice forming bodies are rotatable by a motor 7. Moreover, the stick 3 for cleaning is capable of reciprocating motion and rotation in the longitudinal direction by a stick driving mechanism 4 composed of a motor, a gear, a pulley with an eccentricity, or the like.
申请公布号 JP2001164370(A) 申请公布日期 2001.06.19
申请号 JP19990351831 申请日期 1999.12.10
申请人 NEC KYUSHU LTD 发明人 YOSHIZUMI NOBORU
分类号 H01L21/31;C23C16/44;C23C16/455;H01L21/285;(IPC1-7):C23C16/455 主分类号 H01L21/31
代理机构 代理人
主权项
地址