| 摘要 |
PROBLEM TO BE SOLVED: To form an excellent optical thin film layer on a glass substrate by the plasma electron current. SOLUTION: The manufacturing method of an optical thin film glass, in which the plasma electron current 27a from a plasma gun 20 is expanded in a sheet to form a sheet plasma 27, a metal target 3 and the glass substrate 4 are disposed facing and parallel to each other across the sheet plasma 27, the sputtering voltage is applied to the target 3, the inert gas ions in the plasma are collided with the target 3 to generate the metal vapor, the metal vapor reacts with oxygen gas fed from a manifold pipe 11 provided close to the glass substrate 41 to form a metal oxide film on the glass substrate 41, comprises a first step of setting the temperature of the glass substrate 41 to room temperature and forming a buffer layer 42 on the glass substrate at a low forming speed, and a second step of heating the glass substrate 41 and forming an optical thin film layer 43 on the buffer layer 42 at a high forming speed.
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