METHOD AND APPARATUS FOR FORMING POROUS FILM, AND METHOD AND APPARATUS FOR FORMING FINE SPHERE

摘要

PROBLEM TO BE SOLVED: To provide a method and an apparatus for forming porous film capable of exhibiting stable performance by forming fine spheres having a fixed size. SOLUTION: A raw material 11 for fine spheres, containing a liquid organometallic compound or a liquid organosilicon compound is formed into fine particles to provide liquid fine particles 15. The resultant liquid fine particles 15 are heated to decompose the liquid organometallic compound or the liquid organosilicon compound, and the decomposed products are cooled to provide the fine spheres 15b. The obtained fine spheres 15b are attached to a semiconductor wafer 18 to form the objective porous film 17 composed of the fine spheres 15b.