发明名称 CLEANING DEVICE AND METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICE AND LIQUID CRYSTAL ELEMENT
摘要 PROBLEM TO BE SOLVED: To make a cleaning body 7 vibrate faithfully correspondingly to the vibration of the surface to be cleaned due to the warp of the subject 16 to be cleaned by enhancing the control accuracy of contact pressure to be applied on the subject 16 such as a semiconductor water and an LCD substrate. SOLUTION: This cleaning device is provided with a housing 1 having a shaft penetrating hole 3, a static pressure bearing 4 fit to the inner peripheral surface of the hole 3, a cleaning body fitting shaft 5 penetrated in the hole 3 through the bearing 4 so that it is freely movable in the axial direction, the cleaning body 7 fit to the tip part of the shaft 5 and fitting shaft driving mechanisms 8-11 for moving the position of the shaft 5 in the axial direction. Driving force to keep such a state that the body 7 comes into contact with the surface of the subject 16 under the prescribed contact pressure via a liquid layer is given to the shaft 5 by the mechanisms 8-11 to clean the subject 16. It is preferable that the contact pressure is detected by pressure detecting sensor 14 and the mechanisms 8-11 are controlled according to the detected result.
申请公布号 JP2001293445(A) 申请公布日期 2001.10.23
申请号 JP20000113282 申请日期 2000.04.14
申请人 SONY CORP 发明人 KIYOKAWA AKIKAZU
分类号 G02F1/13;B08B1/04;B08B3/04;B08B7/04;G09F9/00;H01L21/304;(IPC1-7):B08B7/04 主分类号 G02F1/13
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