发明名称 |
MANUFACTURING METHOD OF GROUP III NITRIDE SINGLE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a group III nitride single crystal of high quality that develops a crystal on a substrate by reacting a group III raw material gas and a nitrogen source gas and can reduce crystal defects causing bright points.SOLUTION: A manufacturing method of a group III nitride single crystal that develops a group III nitride single crystal on a base substrate by reacting a group III raw material gas and a nitrogen source gas is characterized by initiating the reaction of the group III raw material gas and the nitrogen source gas in the presence of a halogen-based gas.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016216342(A) |
申请公布日期 |
2016.12.22 |
申请号 |
JP20150236294 |
申请日期 |
2015.12.03 |
申请人 |
TOKUYAMA CORP |
发明人 |
FUKUDA MASAYUKI;NAGASHIMA TORU |
分类号 |
C30B29/38;C23C16/34;C23C16/455;C30B25/14;H01L33/32 |
主分类号 |
C30B29/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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