发明名称 MANUFACTURING METHOD OF GROUP III NITRIDE SINGLE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a group III nitride single crystal of high quality that develops a crystal on a substrate by reacting a group III raw material gas and a nitrogen source gas and can reduce crystal defects causing bright points.SOLUTION: A manufacturing method of a group III nitride single crystal that develops a group III nitride single crystal on a base substrate by reacting a group III raw material gas and a nitrogen source gas is characterized by initiating the reaction of the group III raw material gas and the nitrogen source gas in the presence of a halogen-based gas.SELECTED DRAWING: Figure 1
申请公布号 JP2016216342(A) 申请公布日期 2016.12.22
申请号 JP20150236294 申请日期 2015.12.03
申请人 TOKUYAMA CORP 发明人 FUKUDA MASAYUKI;NAGASHIMA TORU
分类号 C30B29/38;C23C16/34;C23C16/455;C30B25/14;H01L33/32 主分类号 C30B29/38
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