| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and device for cleaning and passivating a laser discharge chamber by plasma. SOLUTION: Oxygen-based plasma is formed at an external plasma source by guiding and applying a high-frequency signal to a gas containing oxygen. The oxygen-based plasma is drawn into a laser discharge chamber, reacts with a contaminant, and cleans the internal surface. After cleaning, fluorine-based plasma is formed at the plasma source, and is drawn into the laser discharge chamber to passivate the inner surface. In another embodiment, the oxygen-based plasma and fluorine-based plasma are formed in the laser discharge chamber by applying a high-frequency signal to a laser discharge chamber electrode, thus exciting the gas containing oxygen and that containing fluorine. |
