METHOD FOR MANUFACTURING METAL MASK

摘要

PURPOSE: A method for manufacturing a metal mask is provided to prevent bull's eye effect and contamination and to achieve narrow-width patterning by removing a metal layer deposited on the sidewall of a photoresist mask using a lift-off process. CONSTITUTION: A silica layer is formed on a silicon substrate(11). A photoresist is formed on the silica layer by spin coating process. The photoresist is patterned to form a photoresist mask. On the silica layer and photoresist mask, a metal layer is formed by sputtering process. The metal layer deposited on the sidewall of the photoresist mask is removed by a wet etching. The photoresist mask is removed with an etchant of photoresist to form a metal mask(17) for forming silica optical waveguide. The silica layer is formed by a flame hydrolysis deposition process.