METHOD FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

摘要

PURPOSE: To improve the superposition margin of patterns. CONSTITUTION: The mask patterns formed on a photomask, in transferring through-holes 17 on a pair of contact holes 10b holding data lines DL in-between, in such a manner that a pair of the through-holes 17 holding the data lines DL in-between are arranged with deviations in a direction spacing from the data lines DL in the step of designing so as to be connected to the contact holes 10b but not connected to the data lines DL even if the through-holes are misaligned in their positions are used.