发明名称 METALLIC OXIDE THIN FILM AND METHOD OF FORMING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a method of forming a uniform metallic oxide thin film free from cracks on a substrate, and provide a metallic oxide thin film using the same. SOLUTION: A metallic oxide oligomer-unsaturated organic compound solvent complex-containing solution prepared by a solution containing metallic salts and an unsaturated organic compound solvent is adhered to a substrate, and thereafter the unsaturated organic compound solvent of 20% or more in the adherent solution is removed by means of substantially preventing diffusion and mixing of between substrate constituents and the metallic oxide oligomer, and heat treatment is then conducted at temperature of 100-1,300 deg.C for 1-24 hours to form the metallic oxide film on the substrate.
申请公布号 JP2002097018(A) 申请公布日期 2002.04.02
申请号 JP20000291383 申请日期 2000.09.26
申请人 JAPAN CARLIT CO LTD:THE;RENGAKUJI SEIICHI 发明人 HARA YOSUKE;SHINAGAWA AKIHIRO;SHINDO NAGAMITSU;KUBOTA KAZUHIRO;KATO TAKURO;RENGAKUJI SEIICHI
分类号 C01G1/02;C01G1/00;C01G23/00;C01G23/04;H01L21/316;(IPC1-7):C01G1/02 主分类号 C01G1/02
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